Author Affiliations
Abstract
1 National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
2 Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, Jena 07743, Germany
3 Technische Universität Braunschweig, Laboratory for Emerging Nanometrology, Pockelsstr. 14, Braunschweig 38106, Germany
4 Physikalisch-Technische Bundesanstalt, Bundesallee 100, Braunschweig 38116, Germany
Near-field holography (NFH), with its virtues of precise critical dimensions and high throughput, has a great potential for the realization of soft x-ray diffraction gratings. We show that NFH with reflections reduced by the integration of antireflective coatings (ARCs) simplifies the NFH process relative to that of setups using refractive index liquids. Based on the proposed NFH with ARCs, gold-coated laminar gratings were fabricated using NFH and subsequent ion beam etching. The efficiency angular spectrum shows that the stray light of the gratings is reduced one level of magnitude by the suppression of interface reflections during NFH.
050.1950 Diffraction gratings 120.4610 Optical fabrication 220.4000 Microstructure fabrication 340.7480 X-rays, soft x-rays, extreme ultraviolet (EUV) Chinese Optics Letters
2016, 14(9): 090501
Author Affiliations
Abstract
In this letter, the application of dry etching to prepare Black Silicon nanostructures on crystalline silicon thin films on glass is described. The utilized reactive ion etching with an inductively coupled plasma (ICP-RIE) of SF6 and O2 is discussed and a remarkable increase in light absorption of about 70% is demonstrated.
160.0160 Materials 240.0240 Optics at surfaces 310.0310 Thin films 250.0250 Optoelectronics Chinese Optics Letters
2013, 11(s1): S10502
1 ZIK “ultra-optics”,Institute of Applied Physics,Friedrich Schiller University Jena,Max-Wien-Platz 1,07743 Jena,Germany
2 Institute of Condensed Matter Theory and Solid State Optics,Friedrich Schiller University Jena,Max-Wien-Platz 1,07743 Jena,Germany
3 Institute of Photonic Technology,Albert-Einstein-Str.9,07745 Jena,Germany
4 Fraunhofer Institute of Applied Optics and Precision Engineering,Albert-Einstein-Str.7,07745 Jena,Germany
